DLP Discovery 4100 Development Platform
This product has been released to the market and is available for purchase. For some products, newer alternatives may be available.
DLP7000 Board Design (Rev. A)
(ZIP 6229 KB)
30 Jul 2019
DLPC410 Board Design Files (Rev. B)
(ZIP 16845 KB)
30 Jul 2019
DLP9500 Board Design (Rev. A)
(ZIP 14035 KB)
30 Jul 2019
The DLP® Discovery™ 4100 development platform provides multiple bundling options for high performance and highly flexible programming of light steering applications, such as 3D printing for additive manufacturing and direct digital imaging for light exposure solutions. Performance features include resolution up to 1080p and pattern rates up to 32,500 Hz for light exposure and image capture that enable competitive cycle times in industrial markets.
At the heart of the DLP Discovery 4100 development platform is the DLPLCR410CEVM, a common controller evaluation board that provides control and power electronics compatible with five digital micromirror device (DMD) options in the visible, near-infrared, and ultraviolet (UV) range: DLP650LNIR, DLP7000, DLP7000UV, DLP9500, and DLP9500UV. Each DMD is well-suited for solutions requiring high resolution, optical throughput and brightness. The featured DLPC410 DMD controller is compatible with several user-selected processors and FPGAs, offering more flexibility to format and sequence light patterns. Designers also have advanced control of the DMD through random row addressing in addition to full frame input, enabling diverse architectures for industrial, medical, and instrumentation applications.
The DLP® Discovery™ 4100 evaluation modules available to bundle with the DLPLCRC410EVM controller evaluation module include:
|DMD Evaluation Module||DLPLCR65NEVM||DLPLCR70EVM||DLPLCR95EVM||DLPLCR70UVEVM||DLPLCR95UVEVM|
|Wavelength Range||800-2000 nm||400-700 nm||400-700 nm||363-420 nm||363-420 nm|
|Micromirror Array Size||1024 x 800||1024 x 768||1920 x 1080||1024 x 768||1920 x 1080|
|Micromirror Array Diagonal (inch)||0.65||0.7||0.95||0.7||0.95|
|Micromirror Pixel Pitch (µm)||10.8||13.6||10.8||13.6||10.8|
|Maximum Binary Pattern/Second||12,500||32,552||23,148||32,552||23,148|
|Data Rate (GB/s)||12||25.6||48||25.6||48|
|Micromirror Tilt Angle (degrees)||+/-12|
DLP System Design Considerations in UVA (363 to 420 nm)
This application report examines some of the thermal, duty cycle, general optical, coherency, and high de-magnification design considerations.