The DLPLCRC410EVM, paired with one of five other DMD-based EVMs, is an evaluation platform exhibiting advanced light control for applications like lithography, 3D Printing (SLS and SLA), Machine Vision, and Marking and Coding. This EVM enables evaluations of new customer illumination sources, optics, algorithm, and exposure processes to quicken potential evalation of DLP technology, customer learning cycles, and times to market.
| Type | Title | Date | ||
|---|---|---|---|---|
| * | EVM User's guide | DLP Discovery 4100 Development Kit Software EVM User’s Guide (Rev. B) | PDF | HTML | 05 Mar 2023 |
| Certificate | DLPLCRC410EVM EU Declaration of Conformity (DoC) | 14 Jul 2023 | ||
| Application note | Wavelength Transmittance Considerations for DLP DMD Windows (Rev. E) | 17 Dec 2019 | ||
| Application note | System Design Considerations Using TI DLP® Technology in UVA (363 – 420 nm) (Rev. A) | 02 Oct 2019 | ||
| White paper | High-power NIR laser system benefits with TI’s DLP® technology | 12 Dec 2018 | ||
| User guide | Discovery 4100 APPSFPGA PGen Design (Rev. A) | 04 Dec 2018 | ||
| User guide | DLP Discovery 4100 Controller Board API Programmer’s Guide (Rev. A) | 03 Dec 2018 | ||
| Application note | DMD 101: Introduction to Digital Micromirror Device (DMD) Technology (Rev. B) | 23 Feb 2018 | ||
| Application note | System Design Considerations Using TI DLP Technology Down to 400 nm | 12 Nov 2014 |
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