近紫外線產品 (400 至 420 nm)

高速、可完整編程結構光和模式投影應用中的近紫外線波長最佳化

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TI DLP® 技術採用專門設計的近紫外線裝置,爲 3D 掃描和機械視覺提供一系列高速晶片。可編程模式、可擴充平台與高速像素資料速率,實現低於 420nm 的創新結構光設計和其他模式產生解決方案。利用第三方光學模組、演算法軟體和設計支援,迅速開始您的設計。

設計與開發資源

光學模組
DLP® 產品第三方搜尋工具

To best meet your design needs and accelerate your time-to-market, DLP® Products works with a variety of third parties to help with everything from optical modules and hardware design to specialty software and other production services. Download one or both search tools listed below to quickly (...)

參考設計
適用於工業 3D 列印和數位印刷的高速 DLP 子系統參考設計

The High Speed DLP® Sub-system Reference Design provides system-level DLP development board designs for industrial Digital Lithography and 3D Printing applications that require high resolution, superior speed and production reliability. The system design offers maximum throughput by integrating (...)

開發板
DLP® 0.65 英吋、1080p、S600 數位微型反射鏡元件 (DMD) 評估模組

This DLP evaluation module (EVM) houses the DLP6500FYE, a 0.65-inch 2xLVDS digital micromirror device (DMD) containing 1920 x 1080 micromirrors with 7.56-µm pitch. When paired with the DLPLCRC900EVM, users get pixel accurate control with 1-bit pattern rates up to 9,523-Hz.

The DLPLCR65EVM is the (...)