Near-UV products (400 to 420 nm)

使用近紫外線波長進行 3D 列印和數位曝光最佳化，以獲得可靠、高精確度、高光學功率與高速效能

DLP 3D 列印與直接成像產品採用特別設計的近紫外線裝置，具備精準的像素控制、靈活資料載入與快速，最適合高速、高精度的數位曝光應用。這些產品支援從樹脂式 SLA 3D 列印到數位曝光應用的各種 400 - 420nm 應用，例如 PCB 的雷射直接成像 (LDI)、進階封裝、FPD 與半導體晶圓等。此外也提供第三方支援，讓您迅速開始設計。

設計與開發資源

光學模組

DLP® 產品第三方搜尋工具

To best meet your design needs and accelerate your time-to-market, DLP® Products works with a variety of third parties to help with everything from optical modules and hardware design to specialty software and other production services. Download one or both search tools listed below to quickly (...)

開發板

DLP® 0.65 英吋、1080p、S600 數位微型反射鏡元件 (DMD) 評估模組

This DLP evaluation module (EVM) houses the DLP6500FYE, a 0.65-inch 2xLVDS digital micromirror device (DMD) containing 1920 x 1080 micromirrors with 7.56-µm pitch. When paired with the DLPLCRC900EVM, users get pixel accurate control with 1-bit pattern rates up to 9,523-Hz.

The DLPLCR65EVM is the (...)

開發板

DLP® 0.90 英吋、WQXGA、A 型數位微型反射鏡元件 (DMD) 評估模組

This DLP evaluation module (EVM) houses the DLP9000, a 0.9-inch 2xLVDS digital micromirror device (DMD) containing 2560 x 1600 micromirrors with 7.56-µm pitch. When paired with the DLPLCRC900DEVM, users get pixel accurate control with 1-bit pattern rates up to 9,523-Hz.

The DLPLCR90EVM is the right (...)