SLVK222 August   2025 TPS7H5020-SP

 

  1.   1
  2.   2
  3.   Trademarks
  4. Introduction
  5. Single-Event Effects (SEE)
  6. Device and Test Board Information
  7. Irradiation Facility and Setup
  8. LETEFF and Range Calculation
  9. Test Setup and Procedures
  10. Destructive Single-Event Effects (DSEE)
    1. 7.1 Single-Event Latch-up (SEL) Results
    2. 7.2 Single-Event Burnout (SEB) and Single-Event Gate Rupture (SEGR) Results
  11. Single-Event Transients (SET)
  12. Event Rate Calculations
  13. 10Summary
  14.   A References

Single-Event Burnout (SEB) and Single-Event Gate Rupture (SEGR) Results

During the SEB/SEGR characterization, the device was tested at room temperature of approximately 25°C. The device was tested under both the enabled and disabled mode. For the SEB-OFF mode the device was disabled using the EN-pin by forcing 0V (using CH # 1 of a E36311A Keysight PS). During the SEB/SEGR testing with the device enabled/disabled, not a single input current event was observed.

The species used for the SEB testing was 165Ho at 15MeV/nucleon and 169Tm at 19.5MeV/nucleon. For both ions an angle of 0° was used to achieve a LETEFF of ≈75MeV·cm2/mg (for more details refer to Ion LETEFF and Range in Silicon). The kinetic energy in the vacuum for 165Ho is 2.474GeV and 169Tm is 3.295GeV. Flux of approximately 4 × 104 to 1 × 105 ions×cm2/s and a fluence of ≈107 ions/cm2 was used for the run. Run duration to achieve this fluence was ≈2 minutes. The 6 production devices and 7 pre-production devices (same as used in SEL testing) were powered up and exposed to the heavy-ions using the maximum recommended bias conditions. No SEB/SEGR current events were observed during the 26 runs, indicating that the TPS7H502X-SP is SEB/SEGR-free up to LETEFF = 75MeV·cm2/mg and across the full electrical specifications.Summary of TPS7H502X-SP SEB/SEGR Test Condition and Resultsshows the SEB/SEGR test conditions and results.

Table 7-2 Summary of TPS7H502X-SP SEB/SEGR Test Condition and Results
RUN #UNIT #

Facility

Device Type

Production Type

Mode

IONLETEFF (MeV·cm2/mg)FLUX (ions×cm2/s)FLUENCE (ions/cm2)ENABLED STATUS

VIN (V)

PVIN (V)

VLDO (V)

SEB EVENT?

14

1

TAMU

TPS7H5020-SP

Pre

Silicon

165Ho

75

3.76 x 104

9.99 x 106

EN

14

14

5.5

No

15

1

TAMUTPS7H5020-SPPre

Silicon

165Ho

75

3.83 x 104

9.99 x 106DIS

14

14

5.5

No

16

2

TAMUTPS7H5020-SPPre

Silicon

165Ho

75

1.10 x 105

1.00 x 107

EN

14

14

5.5

No

17

2

TAMUTPS7H5020-SPPre

Silicon

165Ho

75

1.00 x 105

1.00 x 107

DIS

14

14

5.5

No

18

3

TAMUTPS7H5020-SPPre

GaN

165Ho

75

1.05 x 105

1.00 x 107

EN

14

5.5

5.5

No

19

3

TAMUTPS7H5020-SPPre

GaN

165Ho

75

1.60 x 105

1.00 x 107

DIS

14

5.5

5.5

No

20

4

TAMUTPS7H5021-SPPre

Silicon

165Ho

75

1.00 x 105

1.00 x 107

EN

14

14

5.5

No

21

4

TAMUTPS7H5021-SPPre

Silicon

165Ho

75

1.14 x 105

1.00 x 107

DIS

14

14

5.5

No

22

5

TAMUTPS7H5021-SPPre

GaN

165Ho751.04 x 1051.00 x 107EN14

5.5

5.5No

23

5

TAMUTPS7H5021-SPPre

GaN

165Ho751.00 x 1051.00 x 107DIS14

5.5

5.5No

24

6

TAMUTPS7H5021-SPPre

Silicon

165Ho751.09 x 1051.00 x 107EN14

14

5.5No

25

6

TAMUTPS7H5021-SPPre

Silicon

165Ho759.34 x 1041.00 x 107DIS14

14

5.5No

26

7

TAMUTPS7H5021-SPPre

GaN

165Ho75

1.13 x 105

1.00 x 107EN14

5.5

5.5No

27

7

TAMUTPS7H5021-SPPre

GaN

165Ho75

1.10 x 105

1.00 x 107DIS14

5.5

5.5No

28

8

TAMUTPS7H5020-SPFinal

Silicon

165Ho75

1.16 x 105

1.00 x 107EN14

14

5.5No

29

8

TAMUTPS7H5020-SPFinal

Silicon

165Ho75

1.19 x 105

1.00 x 107DIS14

14

5.5No

30

9

TAMUTPS7H5020-SPFinal

GaN

165Ho75

1.12 x 105

1.00 x 107EN

14

5.5

5.5No

31

9

TAMUTPS7H5020-SPFinal

GaN

165Ho75

1.10 x 105

1.00 x 107DIS14

5.5

5.5No

32

10

TAMUTPS7H5021-SPFinal

Silicon

165Ho751.01 x 1051.00 x 107EN14

14

5.5No

33

10

TAMUTPS7H5021-SPFinal

Silicon

165Ho759.50 x 1041.00 x 107DIS14

14

5.5No

34

11

TAMUTPS7H5021-SPFinal

GaN

165Ho751.15 x 1051.00 x 107EN14

5.5

5.5No

35

11

TAMU

TPS7H5021-SP

Final

GaN

165Ho751.14 x 1051.00 x 107DIS14

5.5

5.5No

36

12

KSEE

TPS7H5020-SPFinal

Silicon

169Tm751.06 x 1051.00 x 107EN14

14

5.5No

37

12

KSEE

TPS7H5020-SPFinal

Silicon

169Tm75

9.65 x 104

1.00 x 107DIS14

14

5.5No

38

13

KSEE

TPS7H5021-SPFinal

Silicon

169Tm75

1.06 x 105

1.00 x 107EN14

14

5.5No

39

13

KSEE

TPS7H5021-SPFinal

Silicon

169Tm75

1.04 x 105

1.00 x 107DIS14

14

5.5No

Using the MFTF method described in Single-Event Effects (SEE) Confidence Interval Calculations application report, the upper-bound cross-section (using a 95% confidence level) is calculated as:

σSEB ≤ 1.42 x 10-8 cm2/device for LETEFF = 75MeV·cm2/mg and T = 25°C.

 SEB On Run #28 TPS7H5020-SP
                    Silicon Mode Figure 7-3 SEB On Run #28 TPS7H5020-SP Silicon Mode
 SEB Off Run #29 TPS7H5020-SP Silicon ModeFigure 7-4 SEB Off Run #29 TPS7H5020-SP Silicon Mode
 SEB On Run #32 TPS7H5021-SP GaN Mode Figure 7-5 SEB On Run #32 TPS7H5021-SP GaN Mode
 SEB Off Run #33 TPS7H5021-SP GaN ModeFigure 7-6 SEB Off Run #33 TPS7H5021-SP GaN Mode